Vacuum Technology and Applications

David J. Hucknall

• Publisher: Butterworth-Heinemann
• Year: 2013
• Print ISBN: 9780750611459
• eBook ISBN: 9781483103334
• Topic: Technology & Engineering
• Subtopic: Physics
• Index: Physics

Vacuum Technology and Applications reviews the most commonly encountered methods for the production, containment, and measurement of subatmospheric pressure. This book also outlines a number of very important applications of this technology. This text is organized into eight chapters and begins with a brief survey of the fundamental principles of vacuum technology. The succeeding chapters deal with the pumps used for the production of rough-medium and high-ultra-high vacua. These chapters specifically cover their principles, performance, and applications. These topics are followed by a discussion of the devices for residual gas analysis and partial pressure measurement. Other chapters consider the aspects of leak detection using He-specific mass spectrometer and the materials, components, and fabrication of vacuum devices. The final chapters explore the application of vacuum technology in critical areas of industrial activity, such as thin-film technology, semiconductor, metallurgy, and chemical industry. This book will prove useful to practicing mechanical, chemical, and design engineers.

Table of contents

• Front Cover
• Vacuum Technology and Applications
• Copyright Page
• Table of Contents
• Preface
• Acknowledgments
• Chapter 1. Introduction
• Chapter 2. Vacuum pumps (rough–medium range)
• Chapter 3. Vacuum pumps (high–ultra-high range)
• Chapter 4. Pressure measurement
• Chapter 5. Leak detection
• Chapter 6. Vacuum system construction
• Chapter 7. Applications
• Chapter 8. Appendix: units, conversion factors and other data
• Index