Run-to-Run Control in Semiconductor Manufacturing
eBook - PDF

Run-to-Run Control in Semiconductor Manufacturing

  1. 368 pages
  2. English
  3. PDF
  4. Available on iOS & Android
eBook - PDF

Run-to-Run Control in Semiconductor Manufacturing

About this book

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs, " thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

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Yes, you can access Run-to-Run Control in Semiconductor Manufacturing by James Moyne, Enrique del Castillo, Arnon M. Hurwitz in PDF and/or ePUB format, as well as other popular books in Technology & Engineering & Industrial Engineering. We have over one million books available in our catalogue for you to explore.

Table of contents

  1. Front Cover
  2. Preface
  3. Editors
  4. Contributors
  5. Foreword
  6. Table of Contents
  7. Introduction
  8. 1. Advanced Process Control in the Semiconductor Industry
  9. 2. Process Control and Optimization Methods for Run-to-Run Application
  10. 3. Basic R2R Control Algorithms
  11. 4. Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller
  12. 5. An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes
  13. 6. A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry
  14. 7. Existing and Envisioned Control Environment for Semiconductor Manufacturing
  15. 8. Design Requirements for an Integrative* R2R Control Solution
  16. 9. The Generic Cell Controller (GCC)
  17. 10. Derivation of a Piggyback Run-to-Run Control Solution Design
  18. 11. Integrated Run-to-Run Control Solution Examples
  19. 12. Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller-Enabled Solution
  20. 13. Case Study: Furnace Capability Improvement Using a Customized R2R Control Solution
  21. 14. Process Recipe Optimization
  22. 15. Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy
  23. 16. Control of Photolithography Alignment
  24. 17. Age-Based Double EWMA Controller and Its Application to a CMP Process
  25. 18. Advancements in Chemical Mechanical Planarization Process Automation and Control
  26. 19. An Enhanced EWMA Controller for Processes Subject to Random Disturbances
  27. 20. Enabling Generic Interprocess Multistep Control: the Active Controller
  28. Summary and Conclusions
  29. List of Acronyms
  30. Index