
eBook - PDF
Run-to-Run Control in Semiconductor Manufacturing
- 368 pages
- English
- PDF
- Available on iOS & Android
eBook - PDF
Run-to-Run Control in Semiconductor Manufacturing
About this book
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs, " thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
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Yes, you can access Run-to-Run Control in Semiconductor Manufacturing by James Moyne, Enrique del Castillo, Arnon M. Hurwitz in PDF and/or ePUB format, as well as other popular books in Technology & Engineering & Industrial Engineering. We have over one million books available in our catalogue for you to explore.
Information
Table of contents
- Front Cover
- Preface
- Editors
- Contributors
- Foreword
- Table of Contents
- Introduction
- 1. Advanced Process Control in the Semiconductor Industry
- 2. Process Control and Optimization Methods for Run-to-Run Application
- 3. Basic R2R Control Algorithms
- 4. Learning and Optimization Algorithms for an Optimizing Adaptive Quality Controller
- 5. An Adaptive Run-to-Run Optimizing Controller for Linear and Nonlinear Processes
- 6. A Comparative Analysis of Run-to-Run Control Algorithms in the Semiconductor Manufacturing Industry
- 7. Existing and Envisioned Control Environment for Semiconductor Manufacturing
- 8. Design Requirements for an Integrative* R2R Control Solution
- 9. The Generic Cell Controller (GCC)
- 10. Derivation of a Piggyback Run-to-Run Control Solution Design
- 11. Integrated Run-to-Run Control Solution Examples
- 12. Design and Optimization of an Optimizing Adaptive Quality Controller, Generic Cell Controller-Enabled Solution
- 13. Case Study: Furnace Capability Improvement Using a Customized R2R Control Solution
- 14. Process Recipe Optimization
- 15. Multizone Uniformity Control of a CMP Process Utilizing a Pre- and Postmeasurement Strategy
- 16. Control of Photolithography Alignment
- 17. Age-Based Double EWMA Controller and Its Application to a CMP Process
- 18. Advancements in Chemical Mechanical Planarization Process Automation and Control
- 19. An Enhanced EWMA Controller for Processes Subject to Random Disturbances
- 20. Enabling Generic Interprocess Multistep Control: the Active Controller
- Summary and Conclusions
- List of Acronyms
- Index