Plasma Science and Technology

Progress in Physical States and Chemical Reactions

Tetsu Mieno

• Publisher: IntechOpen
• Year: 2016
• Print ISBN:
  9789535146179
• eBook ISBN:
  9789535150671
• Topic: Physical Sciences
• Subtopic: Physical & Theoretical Chemistry

In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide.

Table of contents

• Plasma Science and Technology - Progress in Physical States and Chemical Reactions
• Contents
• Preface
• Section 1 Plasma Processings
• Section 2 Medical and Green Applications of Plasma
• Section 3 Special Plasma Sources
• Section 4 Plasma Diagnostics
• Section 5 Plasmas for Environmental Technology
• Section 6 Basic Plasma Phenomena