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About this book
This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistry of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antireflection layers, and phase shift technology are treated.
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Yes, you can access Diazonaphthoquinone-based Resists by Dammel, Ralph R. in PDF and/or ePUB format, as well as other popular books in Technology & Engineering & Materials Science. We have over one million books available in our catalogue for you to explore.
Information
Table of contents
- Contents
- Preface
- 1 Introduction
- 2 Basic Chemistry of DNQ/Novolak Resists
- 3 Basic Chemistry of Novolaks
- 4 DNQ/Novolak Interactions
- 5 Step-by-Step View of the Lithographic Process
- 6 Advanced Processing Schemes for DNQ Resists
- 7 Outlook on DNQ/Novolak Systems
- Index
- About the Author
