
Principles of Plasma Discharges and Materials Processing
- English
- ePUB (mobile friendly)
- Available on iOS & Android
Principles of Plasma Discharges and Materials Processing
About this book
A new edition of this industry classic on the principles of plasma processing
Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential.
Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields.
Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find:
- Extensive figures and tables to facilitate understanding
- A new chapter covering the recent development of processes involving high-pressure capacitive discharges
- New subsections on discharge and processing chemistry, physics, and diagnostics
Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
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Information
Table of contents
- Cover
- Table of Contents
- Title Page
- Copyright
- Dedication
- List of Figures
- List of Tables
- Preface to Third Edition
- Preface to Second Edition
- Preface to the First Edition
- Symbols, Abbreviations, and Acronyms
- 1 Introduction
- 2 Basic Plasma Equations and Equilibrium
- 3 Atomic Collisions
- 4 Plasma Dynamics
- 5 Diffusion and Transport
- 6 DC Sheaths
- 7 Chemical Reactions and Equilibrium
- 8 Molecular Collisions
- 9 Chemical Kinetics and Surface Processes
- 10 Particle and Energy Balance in Discharges
- 11 Low-Pressure Capacitive Discharges
- 12 Inductive Discharges
- 13 Wave-Heated Discharges
- 14 DC Discharges
- 15 High-Pressure Capacitive Discharges
- 16 Etching
- 17 Deposition and Implantation
- 18 Dusty Plasmas
- 19 Kinetic Theory of Discharges
- Appendix A: Collision Dynamics
- Appendix B: The Collision Integral
- Appendix C: Diffusion Solutions for Variable Mobility Model
- References
- Index
- End User License Agreement